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Rapid optical metrology of critical dimensions of large-area nanostructure arrays with complex patterns
Background
Scatterometry-based metrology has the capability to perform high-throughput inspection of geometric characteristics of large-area nanopatterned surfaces. It utilizes physics-based dependencies between reflectance of light scattered from nanopatterned surfaces for pre-defined set of wavelengths and Critical Dimensions (CDs) of such nanopatterns.
Current...
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