Search results for Computer+%3e+Semiconductors+%3e+Fabrication+and+manufacturing

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Plasma-free anisotropic wet etching method for III-N micro LEDs

Background MicroLED technology are the next big display technology delivering stunning picture quality with spectacularly high resolution and brightness. MicroLED brings all the great aspects of OLED technology—self-emissive, perfect blacks, outstanding color, perfect off-angle viewing—while ditching the organic compounds to produce exceedingly...

Inventor(s): Xiuling Li, Clarence Chan | Published: 5/5/2025

Category(s): Computer > Semiconductors > Fabrication and manufacturing, Computer > Devices (non-semiconductor)

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Surface treatment to shape atomic layer deposition

BackgroundAs device dimensions for integrated circuits continuously scale downwards, significant focus has been devoted to developing alternate processes for the nanofabrication of functional structures. One of the processes being explored is called area-selective atomic layer deposition (AS-ALD). In contrast to conventional lithography techniques,...

Inventor(s): John Ekerdt, Sonali Chopra | Published: 12/8/2023

Category(s): Computer > Semiconductors > Fabrication and manufacturing, Physical sciences > Energy > Battery or electrochemical

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