|
Plasma-free anisotropic wet etching method for III-N micro LEDs
Background
MicroLED technology are the next big display technology delivering stunning picture quality with spectacularly high resolution and brightness. MicroLED brings all the great aspects of OLED technology—self-emissive, perfect blacks, outstanding color, perfect off-angle viewing—while ditching the organic compounds to produce exceedingly...
|
|
Monolithic, unetched BTO strip waveguides
Background
Electro-optic technology relies on the operation of systems/devices through the propagation and interaction of light with various tailored/optically active materials. Typical electro-optical devices are designed to modulate the properties of a light wave (e.g., phase, polarization, amplitude, frequency, direction of propagation) and include...
|
|
Surface treatment to shape atomic layer deposition
BackgroundAs device dimensions for integrated circuits continuously scale downwards, significant focus has been devoted to developing alternate processes for the nanofabrication of functional structures. One of the processes being explored is called area-selective atomic layer deposition (AS-ALD). In contrast to conventional lithography techniques,...
|
